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Specifications |
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Material: |
UV Fused Silica |
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Parallelism: |
< 1 arc sec |
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Clear Aperture: |
> 85% of central dimension |
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Chamfer: |
0.3mm ´ 45° |
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TWD: |
l/10 at 632.8nm |
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Surface Quality: |
10-5 scratch-dig |
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Part No |
Wavelength |
Diameter |
Thickness |
Min R* (%) |
A.O.I. |
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RX-1319-0-UF-2004 |
1319nm |
2.00” |
1mm |
99.5% |
0° |
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RX-1319-0-UF-2008 |
1319nm |
2.00” |
2mm |
99.5% |
0° |
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RX-1545-0-UF-2004 |
1525-1565nm |
2.00” |
1mm |
99.5% |
0° |
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RX-1545-0-UF-2008 |
1525-1565nm |
2.00” |
2mm |
99.5% |
0° |
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RX-1590-0-UF-2004 |
1560-1620nm |
2.00” |
1mm |
99.5% |
0° |
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RX-1590-0-UF-2008 |
1560-1620nm |
2.00” |
2mm |
99.5% |
0° |
* Unpolarized beam
- AR coated windows are also available. Call our application engineer.
- Convex or concave mirrors are also available upon request.
- See Beamsplitter section for partially reflecting mirrors.
Picture Image
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